Nistor, L.L.NistorRichard, OlivierOlivierRichardZhao, ChaoChaoZhaoBender, HugoHugoBenderStesmans, AndreAndreStesmansVan Tendeloo, G.G.Van Tendeloo2021-10-152021-10-152003-04https://imec-publications.be/handle/20.500.12860/7930A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin filmsProceedings paper