Process dependence on defectivity count on copper and dielectric surfaces in post-copper CMP cleaning

Daviot, JeromeJeromeDaviotVaes, JanJanVaes2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13590Process dependence on defectivity count on copper and dielectric surfaces in post-copper CMP cleaningOral presentation