Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration

D'Urzo, LuciaLuciaD'UrzoBayana, HareenHareenBayanaVandereyken, JelleJelleVandereykenFoubert, PhilippePhilippeFoubertWu, AiwenAiwenWuJaber, JadJadJaberHamzik, JamesJamesHamzik2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28289Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtrationProceedings paper10.1117/12.2258582