Single-wafer wet cleaning for a high particle removal efficiency on hydrophobic surface

Sano, Ken-IchiKen-IchiSanoIzumi, A.A.IzumiEitoku, AtsuroAtsuroEitokuSnow, JimJimSnowKesters, ElsElsKestersMertens, PaulPaulMertens2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11164Single-wafer wet cleaning for a high particle removal efficiency on hydrophobic surfaceProceedings paper