Scaling and readiness of underlayers for high-NA EUV lithography

Fallica, RobertoRobertoFallicaDe Simone, DaniloDaniloDe SimoneChen, StevenStevenChenSafdar, MuhammadMuhammadSafdarSuh, Hyo SeonHyo SeonSuh2023-05-242023-03-222023-05-2420220277-786XWOS:000944102600030https://imec-publications.be/handle/20.500.12860/41329Scaling and readiness of underlayers for high-NA EUV lithographyProceedings paper10.1117/12.2645864978-1-5106-5640-6WOS:000944102600030GROWTH