Unusual noise behavior versus temperature in nFinFETs on silicon on insulator (SOI) substrates processed with different strain techniques

Guo, WeiWeiGuoRoutoure, J.M.J.M.RoutoureCretu, B.B.CretuCarin, R.R.CarinSimoen, EddyEddySimoenMercha, AbdelkarimAbdelkarimMerchaCollaert, NadineNadineCollaertPut, SofieSofiePutClaeys, CorCorClaeys2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13827Unusual noise behavior versus temperature in nFinFETs on silicon on insulator (SOI) substrates processed with different strain techniquesProceedings paper