Atomic layer deposition of barriers for interconnect

Besling, WimWimBeslingSatta, AlessandraAlessandraSattaSchuhmacher, JörgJörgSchuhmacherAbell, ThomasThomasAbellSutcliffe, VictorVictorSutcliffeMartin Hoyas, AnaAnaMartin HoyasBeyer, GeraldGeraldBeyerGravesteijn, DirkDirkGravesteijnMaex, KarenKarenMaex2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6007Atomic layer deposition of barriers for interconnectProceedings paper