Performance assessment of novel resist approaches for EUV lithography using a single figure of merit

Van Steenwinckel, DavidDavidVan SteenwinckelGronheid, RoelRoelGronheidVan Roey, FriedaFriedaVan Roey2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/13102Performance assessment of novel resist approaches for EUV lithography using a single figure of meritProceedings paper