An investigation of the electron tunneling leakage current through ultrathin oxides/high-k gate stacks at inversion conditions

Govoreanu, BogdanBogdanGovoreanuBlomme, PieterPieterBlommeHenson, KirklenKirklenHensonVan Houdt, JanJanVan HoudtDe Meyer, KristinKristinDe Meyer2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7623An investigation of the electron tunneling leakage current through ultrathin oxides/high-k gate stacks at inversion conditionsProceedings paper