Torregiani, CristinaCristinaTorregianiKittl, JorgeJorgeKittlCapponi, SimonaSimonaCapponiVanhoyland, GeertGeertVanhoylandBrongersma, SywertSywertBrongersmaLauwers, AnneAnneLauwersVan Houtte, PaulPaulVan HoutteMaex, KarenKarenMaex2021-10-162021-10-162005-05https://imec-publications.be/handle/20.500.12860/11329Study of stress evolution during full silicidation for gate stacksProceedings paper