Wen, Liang GongLiang GongWenRoussel, PhilippePhilippeRousselVarela Pedreira, OlallaOlallaVarela PedreiraBriggs, BasoeneBasoeneBriggsGroven, BenjaminBenjaminGrovenDutta, ShibeshShibeshDuttaPopovici, Mihaela IoanaMihaela IoanaPopoviciHeylen, NancyNancyHeylenCiofi, IvanIvanCiofiVanstreels, KrisKrisVanstreelsOsterberg, FrederikFrederikOsterbergHansen, OleOleHansenPetersen, Dirch H.Dirch H.PetersenOpsomer, KarlKarlOpsomerDetavernie, ChristopheChristopheDetavernieWilson, ChrisChrisWilsonVan Elshocht, SvenSvenVan ElshochtCroes, KristofKristofCroesBommels, JurgenJurgenBommelsTokei, ZsoltZsoltTokeiAdelmann, ChristophChristophAdelmann2021-10-232021-10-232016-091944-8244https://imec-publications.be/handle/20.500.12860/27584Atomic layer deposition of ruthenium with TiN interface for sub-10nm advanced interconnects beyond copperJournal articlehttp://pubs.acs.org/doi/abs/10.1021/acsami.6b07181