Toward sub-20nm pitch Fin patterning and integration with DSA

Sayan, SafakSafakSayanMarzook, TaisirTaisirMarzookChan, BTBTChanVandenbroeck, NadiaNadiaVandenbroeckSingh, ArjunArjunSinghLaidler, DavidDavidLaidlerAltamirano Sanchez, EfrainEfrainAltamirano SanchezLeray, PhilippePhilippeLerayRincon Delgadillo, PaulinaPaulinaRincon DelgadilloGronheid, RoelRoelGronheidVandenberghe, GeertGeertVandenbergheClark, WilliamWilliamClarkJuncker, AurelieAurelieJuncker2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27273Toward sub-20nm pitch Fin patterning and integration with DSAProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2510880