Electromigration-induced drift in damascene and plasma-etched Al(Cu). II: Mass transport mechanisms in bamboo interconnects

Proost, JorisJorisProostMaex, KarenKarenMaexDelaey, L.L.Delaey2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4680Electromigration-induced drift in damascene and plasma-etched Al(Cu). II: Mass transport mechanisms in bamboo interconnectsJournal article