Using machine learning algorithms on review sem images to understand stochastic behaviour of EUV based patterning for n7 and smaller nodes

Halder, SandipSandipHalderCerbu, DorinDorinCerbuLeray, PhilippePhilippeLeray2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30837Using machine learning algorithms on review sem images to understand stochastic behaviour of EUV based patterning for n7 and smaller nodesOral presentationhttps://spie.org/PUV18/conferencedetails/international-conference-extreme-ultraviolet-lithography