Formation of ultra-thin PtSi layers with a 2-step silicidation process

Donaton, R. A.R. A.DonatonJin, S.S.JinBender, HugoHugoBenderZagrebnov, MaximMaximZagrebnovBaert, KrisKrisBaertMaex, KarenKarenMaexVantomme, AndreAndreVantommeLangouche, G.G.Langouche2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/1868Formation of ultra-thin PtSi layers with a 2-step silicidation processJournal article