Hf-based high-k dielectrics for p-Ge MOS gate stacks

Fadida, SivanSivanFadidaPalumbo, FelixFelixPalumboNyns, LauraLauraNynsLin, DennisDennisLinVan Elshocht, SvenSvenVan ElshochtCaymax, MattyMattyCaymaxEizenberg, MosheMosheEizenberg2021-10-222021-10-2220141071-1023https://imec-publications.be/handle/20.500.12860/23800Hf-based high-k dielectrics for p-Ge MOS gate stacksJournal articlehttp://scitation.aip.org/content/avs/journal/jvstb/32/3/10.1116/1.4837295