Lucas, KevinKevinLucasWord, JamesJamesWordVandenberghe, GeertGeertVandenbergheVerhaegen, StafStafVerhaegenJonckheere, RikRikJonckheere2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5458Model based OPC for 1st generation 193-nm lithographyProceedings paper