In-Situ HCl etching of InP in shallow-trench-isolated structures

Orzali, TommasoTommasoOrzaliWang, G.G.WangWaldron, NiamhNiamhWaldronMerckling, ClementClementMercklingRichard, OlivierOlivierRichardBender, HugoHugoBenderWang, Wei-EWei-EWangCaymax, MattyMattyCaymax2021-10-202021-10-2020120013-4651https://imec-publications.be/handle/20.500.12860/21237In-Situ HCl etching of InP in shallow-trench-isolated structuresJournal article