Dependence of etching rate on aspect ratio for high aspect TSV etching

Taichi, NishioNishioTaichiAoi, NobuoNobuoAoiSasago, MasaruMasaruSasagoKubota, MasafumiMasafumiKubotaKostermans, MaartenMaartenKostermansBrouri, MohandMohandBrouriDupont, TaniaTaniaDupont2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18061Dependence of etching rate on aspect ratio for high aspect TSV etchingProceedings paperhttps://secure1.gakkai-web.net/gakkai/jsap_pro/english/pro/bunrui13.html#15p_P8