Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node

Gronheid, RoelRoelGronheidYounkin, ToddToddYounkinLeeson, Michael J.Michael J.LeesonFonseca, CarlosCarlosFonsecaHooge, Joshua S.Joshua S.HoogeNafus, KathleenKathleenNafusBiafore, John J.John J.BiaforeSmith, Mark D.Mark D.Smith2021-10-192021-10-1920111537-1646https://imec-publications.be/handle/20.500.12860/19015Extreme-ultraviolet secondary electron blur at the 22-nm half pitch nodeJournal article