Antenna test structure matrix description, application for optimized HDP oxide deposition, metal etch, Ar preclean and passivation processing in sub-half micron CMOS processing

Ackaert, J.J.Ackaertde Backer, E.E.de BackerCoppens, P.P.CoppensCreusen, MartinMartinCreusen2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3178Antenna test structure matrix description, application for optimized HDP oxide deposition, metal etch, Ar preclean and passivation processing in sub-half micron CMOS processingOral presentation