Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective

Thakare, DeveshDeveshThakarede Marneffe, Jean-FrancoisJean-Francoisde MarneffeDelabie, AnneliesAnneliesDelabiePhilipsen, VickyVickyPhilipsen2024-03-182023-10-072024-03-1820232590-0072WOS:001069211300001https://imec-publications.be/handle/20.500.12860/42662Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspectiveJournal article10.1016/j.mne.2023.100223WOS:001069211300001RU THIN-FILMSETCHING MECHANISMIMPROVEMENTDEPOSITIONSTABILITYRUTHENIUMTA