Tsvetanova, DianaDianaTsvetanovaVos, RitaRitaVosVereecke, GuyGuyVereeckeClemente, FrancescaFrancescaClementeVanstreels, KrisKrisVanstreelsConard, ThierryThierryConardVogt, TatjanaTatjanaVogtMertens, PaulPaulMertensHeyns, MarcMarcHeyns2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16330Characterization of 248nm deep ultraviolet (DUV) photoresist after ion implantationProceedings paper