Investigation of interactions between metrology and lithography with a CD SEM simulator

Smith, Mark D.Mark D.SmithFang, ChaoChaoFangBiafore, John J.John J.BiaforeVaglio Pret, AlessandroAlessandroVaglio PretRobinson, Stewart A.Stewart A.Robinson2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24547Investigation of interactions between metrology and lithography with a CD SEM simulatorProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1854361