Montgomery, P.K.P.K.MontgomeryLucas, K.K.LucasStrozewski, K.J.K.J.StrozewskiZavyalova, L.L.ZavyalovaGrozev, GrozdanGrozdanGrozevReybrouck, MarioMarioReybrouckTzviatkov, P.P.TzviatkovMaenhoudt, MireilleMireilleMaenhoudt2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7911Resist reflow for 193-nm low-K1 lithography contactsProceedings paper