Cluster optimization to improve total CD control as an enabler for double patterning

Laidler, DavidDavidLaidlerD'have, KoenKoenD'haveRosslee, CraigCraigRossleeTedeschi, LenLenTedeschi2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13975Cluster optimization to improve total CD control as an enabler for double patterningProceedings paper