In-line monitoring of HF-last cleaning of implanted and non-implanted silicon surfaces by non-contact surface charge measurements

Kondoh, EiichiEiichiKondohTrauwaert, Marie-AstridMarie-AstridTrauwaertHeyns, MarcMarcHeynsMaex, KarenKarenMaex2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2678In-line monitoring of HF-last cleaning of implanted and non-implanted silicon surfaces by non-contact surface charge measurementsProceedings paper