Vereecke, GuyGuyVereeckeClaes, MartineMartineClaesLe, Quoc ToanQuoc ToanLeKesters, ElsElsKestersStruyf, HerbertHerbertStruyfCarleer, RobertRobertCarleerAdriaensens, PeterPeterAdriaensens2021-10-192021-10-1920111099-0062https://imec-publications.be/handle/20.500.12860/20055Characterization of modification of 193-nm photoresist by HBr plasmaJournal articlehttp://link.aip.org/link/?ESL/14/H408