Comparison of CF4, CHF3, and CH2F2 plasmas used for wafer processing

Tinck, StefanStefanTinckMilenin, AlexeyAlexeyMileninBogaerts, AnnemieAnnemieBogaerts2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21612Comparison of CF4, CHF3, and CH2F2 plasmas used for wafer processingMeeting abstracthttp://meetings.aps.org/Meeting/GEC12/Event/173836