Interaction of F atoms with SiCOH ultra low-k films. Part II: Etching

Rakhimova, T.T.RakhimovaLopaev, D.D.LopaevMankelevich, Y.Y.MankelevichKurchikov, K.K.KurchikovZyryanov, S.S.ZyryanovPalov, A.P.A.P.PalovProshina, O.V.O.V.ProshinaMaslakov, K.K.MaslakovBaklanov, MikhaïlMikhaïlBaklanov2021-10-222021-10-2220150022-3727https://imec-publications.be/handle/20.500.12860/25796Interaction of F atoms with SiCOH ultra low-k films. Part II: EtchingJournal articlehttp://iopscience.iop.org/0022-3727/48/17/175204/