Process development using negative tone development for the dark field critical layers in a 28 nm node process

Versluijs, JankoJankoVersluijsTruffert, VincentVincentTruffertMurdoch, GayleGayleMurdochDe Bisschop, PeterPeterDe BisschopTrivkovic, DarkoDarkoTrivkovicWiaux, VincentVincentWiauxKunnen, EddyEddyKunnenSouriau, LaurentLaurentSouriauDemuynck, StevenStevenDemuynckErcken, MoniqueMoniqueErcken2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21798Process development using negative tone development for the dark field critical layers in a 28 nm node processProceedings paper