Scaling of floating gate electrode for sub-40nm flash technologies

De Vos, JoeriJoeriDe VosWellekens, DirkDirkWellekensDebusschere, IngridIngridDebusschereVan Houdt, JanJanVan HoudtVan Aerde, StevenStevenVan AerdeFischer, PamelaPamelaFischerZagwijn, PeterPeterZagwijn2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13625Scaling of floating gate electrode for sub-40nm flash technologiesProceedings paper