Maurer, WilhelmWilhelmMaurerWiaux, VincentVincentWiauxJonckheere, RikRikJonckheerePhilipsen, VickyVickyPhilipsenHoffmann, ThomasThomasHoffmannVerhaegen, StafStafVerhaegenRonse, KurtKurtRonseEngland, Jonathan G.Jonathan G.EnglandHoward, William B.William B.Howard2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6591OPC aware mask and wafer metrologyProceedings paper