Cong Que DinhNagahara, SeijiSeijiNagaharaYoshida, KeisukeKeisukeYoshidaKondo, YoshihiroYoshihiroKondoMuramatsu, MakotoMakotoMuramatsuYoshihara, KosukeKosukeYoshiharaShimada, RyoRyoShimadaMoriya, TeruhikoTeruhikoMoriyaNafus, KathleenKathleenNafusPetersen, JohnJohnPetersenDe Simone, DaniloDaniloDe SimoneFoubert, PhilippePhilippeFoubertVandenberghe, GeertGeertVandenberghe2023-01-192022-09-082023-01-192021978-1-5106-4057-30277-786XWOS:000844537900013https://imec-publications.be/handle/20.500.12860/40390EUV resist performance enhancement by UV flood exposure for high NA EUV lithographyProceedings paper10.1117/12.2583922978-1-5106-4058-0WOS:000844537900013