Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Dusa, MirceaMirceaDusaQuaedackers, JohnJohnQuaedackersLarsen, Olaf F.A.Olaf F.A.LarsenMeessen, J.J.Meessenvan der Heijden, EddyEddyvan der HeijdenDicker, GeraldGeraldDickerWismans, OnnoOnnoWismansde Haas, PaulPaulde Haasvan Ingen Schenau, KoenKoenvan Ingen SchenauFinders, JoJoFindersVleeming, BertBertVleemingStorms, GreetGreetStormsJaenen, PatrickPatrickJaenenCheng, ShauneeShauneeChengMaenhoudt, MireilleMireilleMaenhoudt2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12112Pitch doubling through dual-patterning lithography challenges in integration and litho budgetsProceedings paper