Le, Quoc ToanQuoc ToanLeKesters, ElsElsKestersPrager, LutzLutzPragerClaes, MartineMartineClaesLux, MarcelMarcelLuxVereecke, GuyGuyVereecke2021-10-172021-10-1720091662-9779https://imec-publications.be/handle/20.500.12860/15677Modification of photoresist by UV for post-etch wet strip applicationsJournal article