Mitigating pattern collapse in high-resolution extreme ultraviolet lithography using the organic dry development rinse process

Heo, SeonggilSeonggilHeoBaek, SeungjooSeungjooBaekGupta, MihirMihirGuptaSuh, Hyo SeonHyo SeonSuhKato, KodaiKodaiKatoTakeda, SatoshiSatoshiTakedaShibayama, WataruWataruShibayamaSakamoto, RikimaruRikimaruSakamoto2025-06-192024-10-122025-06-1920241932-5150WOS:001326563600001https://imec-publications.be/handle/20.500.12860/44632Mitigating pattern collapse in high-resolution extreme ultraviolet lithography using the organic dry development rinse processJournal article10.1117/1.JMM.23.3.034603WOS:001326563600001