Kota, Gowri P.Gowri P.KotaRamalingam, ShyamShyamRamalingamLee, SteveSteveLeeCoenegrachts, BartBartCoenegrachtsLee, ChrisChrisLeeBeckx, StephanStephanBeckxDemand, MarcMarcDemandBoullart, WernerWernerBoullart2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9143Sub-65nm etch challenges of high-k and metal gate materialsProceedings paper