Design Technology Co-Optimization for the DRAM Cell Structure With Contact Resistance Variation

Lee, JaehyunJaehyunLeeAsenov, PlamenPlamenAsenovRhyner, RetoRetoRhynerKao, EthanEthanKaoAmoroso, Salvatore M.Salvatore M.AmorosoBrown, Andrew R.Andrew R.BrownLin, Xi-WeiXi-WeiLinMoroz, VictorVictorMoroz2024-08-222024-03-142024-08-2220240018-9383WOS:001167052400002https://imec-publications.be/handle/20.500.12860/43669Design Technology Co-Optimization for the DRAM Cell Structure With Contact Resistance VariationJournal article10.1109/TED.2024.3357615WOS:001167052400002RETENTION TIME DISTRIBUTIONCHALLENGESISSUES