Reliability and Variability-Aware DTCO Flow: Demonstration of Projections to N3 FinFET and Nanosheet Technologies

Rzepa, G.G.RzepaKarner, M.M.KarnerBaumgartner, O.O.BaumgartnerStrof, G.G.StrofSchanovsky, F.F.SchanovskyMitterbauer, F.F.MitterbauerKernstock, C.C.KernstockKarner, H. W.H. W.KarnerStanojevic, Z.Z.StanojevicWeckx, PieterPieterWeckxHellings, GeertGeertHellingsClaes, DieterDieterClaesWu, ZhichengZhichengWuXiang, YangYangXiangChiarella, ThomasThomasChiarellaParvais, BertrandBertrandParvaisMitard, JeromeJeromeMitardFranco, JacopoJacopoFrancoKaczer, BenBenKaczerLinten, DimitriDimitriLinten2022-03-112022-03-1120211541-7026WOS:000672563100083https://imec-publications.be/handle/20.500.12860/39424Reliability and Variability-Aware DTCO Flow: Demonstration of Projections to N3 FinFET and Nanosheet TechnologiesProceedings paper10.1109/IRPS46558.2021.9405172978-1-7281-6893-7WOS:000672563100083IMPACT