Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers

Poonkottil, NithinNithinPoonkottilRijckaert, HannesHannesRijckaertRajendran, KhannanKhannanRajendranPetit, Robin R.Robin R.PetitMartin, Lisa I. D. J.Lisa I. D. J.MartinVan Thourhout, DriesDriesVan ThourhoutVan Driessche, IsabelIsabelVan DriesscheDetavernier, ChristopheChristopheDetavernierDendooven, JolienJolienDendooven2023-07-242023-03-172023-07-2420232196-7350WOS:000936702100001https://imec-publications.be/handle/20.500.12860/41299Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition LayersJournal article10.1002/admi.202201934WOS:000936702100001SELF-ASSEMBLED-MONOLAYERTITANIUM-DIOXIDERUELECTROCATALYSISNANOPARTICLESGROWTHALD