Optimizing EUV OPC Runtime and Pattern Fidelity in DRAM Manufacturing Using Memory OPC Flow

De Gong, ShuShuDe GongChen, Sheng TseSheng TseChenLiao, Chun ChengChun ChengLiaoHuang, Teng YenTeng YenHuangMeng, RenyangRenyangMengYang, KihoKihoYangGillijns, WernerWernerGillijnsLin, Hsin-jungHsin-jungLinMa, Shou-yuanShou-yuanMaTsai, JenHsiangJenHsiangTsaiLin, Ling ChiehLing ChiehLinChou, RyanRyanChouBurbine, AndrewAndrewBurbinePearson, AlexAlexPearsonZhang, XimaXimaZhang2025-07-312025-07-312025978-1-5106-8640-30277-786XWOS:001517361100032https://imec-publications.be/handle/20.500.12860/45978Optimizing EUV OPC Runtime and Pattern Fidelity in DRAM Manufacturing Using Memory OPC FlowProceedings paper10.1117/12.3051007978-1-5106-8641-0WOS:001517361100032