Hikavyy, AndriyAndriyHikavyyPorret, ClémentClémentPorretRosseel, ErikErikRosseelMilenin, AlexeyAlexeyMileninLoo, RogerRogerLoo2021-10-272021-10-2720190268-1242https://imec-publications.be/handle/20.500.12860/33162Application of Cl2 for low temperature etch and epitaxyJournal articlehttps://iopscience.iop.org/article/10.1088/1361-6641/aafc93