Ultra thin hybrid floating gate and high-k dielectric as IGD enabler of highly scaled planar NAND flash technology

Kar, Gouri SankarGouri SankarKarBreuil, LaurentLaurentBreuilBlomme, PieterPieterBlommeHody, HubertHubertHodyLocorotondo, SabrinaSabrinaLocorotondoJossart, NicoNicoJossartRichard, OlivierOlivierRichardBender, HugoHugoBenderVan den Bosch, GeertGeertVan den BoschDebusschere, IngridIngridDebusschereVan Houdt, JanJanVan Houdt2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20905Ultra thin hybrid floating gate and high-k dielectric as IGD enabler of highly scaled planar NAND flash technologyProceedings paper