The role of atomic oxygen in the decomposition of self-assembled monolayers during area-selective atomic layer deposition

O'Connor, R.R.O'ConnorSelvaraju, V.V.SelvarajuHughes, G.G.HughesBogan, J.J.BoganBrady-Boyd, AnitaAnitaBrady-BoydArmini, SilviaSilviaArminiPasquali, MattiaMattiaPasquali2022-05-052022-04-282022-05-0520220169-4332WOS:000778689100003https://imec-publications.be/handle/20.500.12860/39693The role of atomic oxygen in the decomposition of self-assembled monolayers during area-selective atomic layer depositionJournal article10.1016/j.apsusc.2022.152679WOS:000778689100003X-RAY PHOTOELECTRONMETALSURFACESPLASMAOXIDATIONGROWTHCOPPERFILMSOCTADECYLTRIMETHOXYSILANEMECHANISM