Rinsing and drying issues during the post CMP cleaning process

Fyen, WimWimFyenXu, KaidongKaidongXuVan Steenbergen, JanJanVan SteenbergenVereecke, GuyGuyVereeckeVos, RitaRitaVosArnauts, SophiaSophiaArnautsRip, JensJensRipKenis, KarineKarineKenisHolsteyns, FrankFrankHolsteynsHellin, DavidDavidHellinDoumen, GeertGeertDoumenMertens, PaulPaulMertensKraus, HaraldHaraldKrausLee, KimKimLee2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8934Rinsing and drying issues during the post CMP cleaning processProceedings paper