Manufacturing of high aspect-ratio p-n junctions using vapor phase doping for application in multi-Resurf devices

Rochefort, ChristelleChristelleRochefortVan Dalen, RobRobVan DalenDuhayon, NatasjaNatasjaDuhayonVandervorst, WilfriedWilfriedVandervorst2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6760Manufacturing of high aspect-ratio p-n junctions using vapor phase doping for application in multi-Resurf devicesProceedings paper