Atomic layer deposition of GdAlOx and GdHfOx using Gd(iPr-Cp)3

Adelmann, ChristophChristophAdelmannPierreux, DieterDieterPierreuxSwerts, JohanJohanSwertsKesters, JurgenJurgenKestersRichard, OlivierOlivierRichardConard, ThierryThierryConardFranquet, AlexisAlexisFranquetTielens, HildeHildeTielensAfanasiev, ValeriValeriAfanasievSchaekers, MarcMarcSchaekersVan Elshocht, SvenSvenVan Elshocht2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/14869Atomic layer deposition of GdAlOx and GdHfOx using Gd(iPr-Cp)3Meeting abstract