Kinetic to transport-limited anhydrous HF etching of silicon oxynitride films in supercritical CO2

Morrish, RachelRachelMorrishWitvrouw, AnnAnnWitvrouwMuscat, AnthonyAnthonyMuscat2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12597Kinetic to transport-limited anhydrous HF etching of silicon oxynitride films in supercritical CO2Journal article