De Simone, DaniloDaniloDe SimoneVesters, YannickYannickVestersShehzad, AtifAtifShehzadVandenberghe, GeertGeertVandenbergheFoubert, PhilippePhilippeFoubertBeral, ChristopheChristopheBeralVan Den Heuvel, DieterDieterVan Den HeuvelMao, MingMingMaoLazzarino, FredericFredericLazzarino2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/28161Exploring the readiness of EUV photo materials for patterningProceedings paper10.1117/12.2258220